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SEO Pioneer 300 Wafer Surface Digital Analyzer

 

 

 

SEO Pioneer 300 Wafer Surface Digital Analyzer

Product Overview

The Pioneer 300 Wafer Surface Analysis System is specially designed for use in 300 mm semiconductor wafer processing for quality control. The Pioneer 300 provides quick and accurate contact angle/surface energy measurements of the wafer surface to adhesion, cleanliness and surface treatments.

The use of anti-static materials in the Pioneer 300 makes it well suited for semiconductor applications. The inner portions are specially designed to prevent particulate formation or contamination and the system can be used to monitor the ultra clean surface processing of silicon wafers. The position of the sample stage is computer controlled and can be precisely adjusted along the x-,y-, or z- axis. The user can easily control the position of the stage to allow for wafer surface mapping. The instrument uses micro-pump controlled by PC for precise and repeatable liquid drop formation and application. This insures that a reproducible drop volume is applied to the surface.

 

Product Features:

1	Coating assessment of the HMDS process.
2	Wafer mapping Display for surface contamination detection.
3	Adhesive and primer preparation.
4	Coating uniformity & Coating quality.